Canon is making ready to problem Dutch firm ASML with a brand new era of nanoimprint lithography (NIL).
ASML at the moment has a stranglehold on the lithography machines used to etch circuits onto chips. In accordance a press launch, Canon has launched the “FPA-1200NZ2C nanoimprint semiconductor manufacturing gear.”
Canon says its nanoimprint lithography (NIL) expertise will quickly be capable of sample 2nm chips:
Canon’s NIL expertise allows patterning with a minimal linewidth of 14 nm2, equal to the 5-nm-node3 required to supply most superior logic semiconductors that are at the moment accessible. Moreover, with additional enchancment of masks expertise, NIL is anticipated to allow circuit patterning with a minimal linewidth of 10 nm, which corresponds to 2-nm-node.
Canon clearly hopes to regain floor within the semiconductor trade and its new NIL expertise could be the important thing to doing that.